Phase-sensitive bichromatic photoresistance in a two-dimensional electron gas

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We have studied microwave photoresistance in a two-dimensional electron system subject to two radiation fields (frequencies ω₁ and ω₂) using quantum kinetic equation. We have found that when ω₂/ω₁= 1 + 2/N, where N is an integer, and both waves have the same polarization, the displacement mechanism gives rise to a new, phase-sensitive photoresistance. This photoresistance oscillates with the magnetic field and can be a good fraction of the total photoresistance under typical experimental conditions. The inelastic mechanism, on the other hand, gives zero phase-sensitive photoresistance if the radiation fields are circularly polarized.