Entangled-State Lithography: Tailoring any Pattern with a Single State

الأصل · EN

We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binominal states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a (N+1) × (N+1) grid, occupying a square with the side half a wavelength long, can be generated from a 2 N-photon state.